A mathematical model for process control in laser chemical vapor deposition

R. Nassar; W. Dai; C. Zhang; H. Lan; J. Maxwell

A mathematical model for process control in laser chemical vapor deposition

R. Nassar
, W. Dai
, C. Zhang
, H. Lan
, J. Maxwell

Louisiana Tech University

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Original language	English
Title of host publication	2000 International Conference on Modeling and Simulation of Microsystems - MSM 2000
Editors	M. Laudon, B. Romanowicz
Pages	517-519
Number of pages	3
State	Published - 2000
Externally published	Yes
Event	2000 International Conference on Modeling and Simulation of Microsystems - MSM 2000 - San Diego, CA, United States Duration: Mar 27 2000 → Mar 29 2000

Publication series

Series	2000 International Conference on Modeling and Simulation of Microsystems - MSM 2000

Conference

Conference	2000 International Conference on Modeling and Simulation of Microsystems - MSM 2000
Country/Territory	United States
City	San Diego, CA
Period	3/27/00 → 3/29/00

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 9 Industry, Innovation, and Infrastructure

ASJC Scopus Subject Areas

General Engineering

Keywords

Chemical vapor deposition
Mathematical model

Cite this

A mathematical model for process control in laser chemical vapor deposition. / Nassar, R.; Dai, W.; Zhang, C. et al.
2000 International Conference on Modeling and Simulation of Microsystems - MSM 2000. ed. / M. Laudon; B. Romanowicz. 2000. p. 517-519 (2000 International Conference on Modeling and Simulation of Microsystems - MSM 2000).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Nassar, R, Dai, W, Zhang, C, Lan, H & Maxwell, J 2000, A mathematical model for process control in laser chemical vapor deposition. in M Laudon & B Romanowicz (eds), 2000 International Conference on Modeling and Simulation of Microsystems - MSM 2000. 2000 International Conference on Modeling and Simulation of Microsystems - MSM 2000, pp. 517-519, 2000 International Conference on Modeling and Simulation of Microsystems - MSM 2000, San Diego, CA, United States, 3/27/00.

@inproceedings{9c61707d97dd47c782766a39f74f87d9,

title = "A mathematical model for process control in laser chemical vapor deposition",

keywords = "Chemical vapor deposition, Mathematical model",

author = "R. Nassar and W. Dai and C. Zhang and H. Lan and J. Maxwell",

year = "2000",

language = "English",

isbn = "0966613570",

series = "2000 International Conference on Modeling and Simulation of Microsystems - MSM 2000",

pages = "517--519",

editor = "M. Laudon and B. Romanowicz",

booktitle = "2000 International Conference on Modeling and Simulation of Microsystems - MSM 2000",

note = "2000 International Conference on Modeling and Simulation of Microsystems - MSM 2000 ; Conference date: 27-03-2000 Through 29-03-2000",

}

TY - GEN

T1 - A mathematical model for process control in laser chemical vapor deposition

AU - Nassar, R.

AU - Dai, W.

AU - Zhang, C.

AU - Lan, H.

AU - Maxwell, J.

PY - 2000

Y1 - 2000

KW - Chemical vapor deposition

KW - Mathematical model

UR - https://www.scopus.com/pages/publications/0042980898

UR - https://www.scopus.com/pages/publications/0042980898#tab=citedBy

M3 - Conference contribution

AN - SCOPUS:0042980898

SN - 0966613570

T3 - 2000 International Conference on Modeling and Simulation of Microsystems - MSM 2000

SP - 517

EP - 519

BT - 2000 International Conference on Modeling and Simulation of Microsystems - MSM 2000

A2 - Laudon, M.

A2 - Romanowicz, B.

T2 - 2000 International Conference on Modeling and Simulation of Microsystems - MSM 2000

Y2 - 27 March 2000 through 29 March 2000

ER -

A mathematical model for process control in laser chemical vapor deposition

Publication series

Conference

UN SDGs

ASJC Scopus Subject Areas

Keywords

Other files and links

Fingerprint

Cite this