Directed self-assembly of poly(styrene)-block-poly(acrylic acid) copolymers for sub-20nm pitch patterning

Jing Cheng; Richard A. Lawson; Wei Ming Yeh; Nathan D. Jarnagin; Andrew Peters; Laren M. Tolbert; Clifford L. Henderson

doi:10.1117/12.918073

Directed self-assembly of poly(styrene)-block-poly(acrylic acid) copolymers for sub-20nm pitch patterning

Jing Cheng
, Richard A. Lawson
, Wei Ming Yeh
, Nathan D. Jarnagin
, Andrew Peters
, Laren M. Tolbert
, Clifford L. Henderson

Georgia Institute of Technology
School of Chemical and Biomolecular Engineering, Georgia Institute of Technology

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Original language	English
Title of host publication	Alternative Lithographic Technologies IV
Publisher	SPIE
ISBN (Print)	9780819489791
DOIs	https://doi.org/10.1117/12.918073
State	Published - 2012
Externally published	Yes
Event	Alternative Lithographic Technologies IV - San Jose, CA, United States Duration: Feb 13 2012 → Feb 16 2012

Publication series

Series	Proceedings of SPIE - The International Society for Optical Engineering
Volume	8323
ISSN	0277-786X

Conference

Conference	Alternative Lithographic Technologies IV
Country/Territory	United States
City	San Jose, CA
Period	2/13/12 → 2/16/12

ASJC Scopus Subject Areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Keywords

directed self-assembly
Flory Huggins parameter
poly(styrene)-b-poly(acid)
poly(styrene)-b-poly(acrylic acid)
χ

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10.1117/12.918073

Cite this

Directed self-assembly of poly(styrene)-block-poly(acrylic acid) copolymers for sub-20nm pitch patterning. / Cheng, Jing; Lawson, Richard A.; Yeh, Wei Ming et al.
Alternative Lithographic Technologies IV. SPIE, 2012. 83232R (Proceedings of SPIE - The International Society for Optical Engineering, Vol. 8323).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Cheng, J, Lawson, RA, Yeh, WM, Jarnagin, ND, Peters, A, Tolbert, LM & Henderson, CL 2012, Directed self-assembly of poly(styrene)-block-poly(acrylic acid) copolymers for sub-20nm pitch patterning. in Alternative Lithographic Technologies IV., 83232R, SPIE, Proceedings of SPIE - The International Society for Optical Engineering, vol. 8323, Alternative Lithographic Technologies IV, San Jose, CA, United States, 2/13/12. https://doi.org/10.1117/12.918073

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title = "Directed self-assembly of poly(styrene)-block-poly(acrylic acid) copolymers for sub-20nm pitch patterning",

keywords = "directed self-assembly, Flory Huggins parameter, poly(styrene)-b-poly(acid), poly(styrene)-b-poly(acrylic acid), χ",

author = "Jing Cheng and Lawson, \{Richard A.\} and Yeh, \{Wei Ming\} and Jarnagin, \{Nathan D.\} and Andrew Peters and Tolbert, \{Laren M.\} and Henderson, \{Clifford L.\}",

year = "2012",

doi = "10.1117/12.918073",

language = "English",

isbn = "9780819489791",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

booktitle = "Alternative Lithographic Technologies IV",

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AU - Cheng, Jing

AU - Lawson, Richard A.

AU - Yeh, Wei Ming

AU - Jarnagin, Nathan D.

AU - Peters, Andrew

AU - Tolbert, Laren M.

AU - Henderson, Clifford L.

PY - 2012

Y1 - 2012

KW - directed self-assembly

KW - Flory Huggins parameter

KW - poly(styrene)-b-poly(acid)

KW - poly(styrene)-b-poly(acrylic acid)

KW - χ

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M3 - Conference contribution

AN - SCOPUS:84894421803

SN - 9780819489791

T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - Alternative Lithographic Technologies IV

PB - SPIE

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Y2 - 13 February 2012 through 16 February 2012

ER -

Directed self-assembly of poly(styrene)-block-poly(acrylic acid) copolymers for sub-20nm pitch patterning

Publication series

Conference

ASJC Scopus Subject Areas

Keywords

Access to Document

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