Effect of chemoepitaxial guiding underlayer design on the pattern quality and shape of aligned lamellae for fabrication of line-space patterns

Benjamin D. Nation; Andrew J. Peters; Richard A. Lawson; Peter J. Ludovice; Clifford L. Henderson

doi:10.1117/1.JMM.16.4.043502

Effect of chemoepitaxial guiding underlayer design on the pattern quality and shape of aligned lamellae for fabrication of line-space patterns

Benjamin D. Nation
, Andrew J. Peters
, Richard A. Lawson
, Peter J. Ludovice
, Clifford L. Henderson

School of Chemical and Biomolecular Engineering, Georgia Institute of Technology
Georgia Institute of Technology
University of South Florida, Tampa

Research output: Contribution to journal › Article › peer-review

Original language	English
Article number	043502
Journal	Journal of Micro/Nanolithography, MEMS, and MOEMS
Volume	16
Issue number	4
DOIs	https://doi.org/10.1117/1.JMM.16.4.043502
State	Published - Oct 1 2017
Externally published	Yes

ASJC Scopus Subject Areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Mechanical Engineering
Electrical and Electronic Engineering

Keywords

block copolymer
chemoepitaxy
directed self-assembly
footing
line edge roughness
simulation

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Cite this

Effect of chemoepitaxial guiding underlayer design on the pattern quality and shape of aligned lamellae for fabrication of line-space patterns. / Nation, Benjamin D.; Peters, Andrew J.; Lawson, Richard A. et al.
In: Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 16, No. 4, 043502, 01.10.2017.

Research output: Contribution to journal › Article › peer-review

@article{9131b2a3dea744df92d9563fe233fa2f,

title = "Effect of chemoepitaxial guiding underlayer design on the pattern quality and shape of aligned lamellae for fabrication of line-space patterns",

keywords = "block copolymer, chemoepitaxy, directed self-assembly, footing, line edge roughness, simulation",

author = "Nation, \{Benjamin D.\} and Peters, \{Andrew J.\} and Lawson, \{Richard A.\} and Ludovice, \{Peter J.\} and Henderson, \{Clifford L.\}",

note = "Publisher Copyright: {\textcopyright} 2017 Society of Photo-Optical Instrumentation Engineers (SPIE).",

year = "2017",

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doi = "10.1117/1.JMM.16.4.043502",

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AU - Nation, Benjamin D.

AU - Peters, Andrew J.

AU - Lawson, Richard A.

AU - Ludovice, Peter J.

AU - Henderson, Clifford L.

PY - 2017/10/1

Y1 - 2017/10/1

KW - block copolymer

KW - chemoepitaxy

KW - directed self-assembly

KW - footing

KW - line edge roughness

KW - simulation

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DO - 10.1117/1.JMM.16.4.043502

M3 - Article

SN - 1932-5150

VL - 16

JO - Journal of Micro/Nanolithography, MEMS, and MOEMS

JF - Journal of Micro/Nanolithography, MEMS, and MOEMS

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Effect of chemoepitaxial guiding underlayer design on the pattern quality and shape of aligned lamellae for fabrication of line-space patterns

ASJC Scopus Subject Areas

Keywords

Access to Document

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