Effects of block copolymer polydispersity and χN on pattern line edge roughness and line width roughness from directed self-assembly of diblock copolymers

Andrew J. Peters; Richard A. Lawson; Peter J. Ludovice; Clifford L. Henderson

doi:10.1117/12.2021443

Effects of block copolymer polydispersity and χN on pattern line edge roughness and line width roughness from directed self-assembly of diblock copolymers

Andrew J. Peters
, Richard A. Lawson
, Peter J. Ludovice
, Clifford L. Henderson

School of Chemical and Biomolecular Engineering, Georgia Institute of Technology

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Original language	English
Title of host publication	Alternative Lithographic Technologies V
DOIs	https://doi.org/10.1117/12.2021443
State	Published - 2013
Externally published	Yes
Event	Alternative Lithographic Technologies V - San Jose, CA, United States Duration: Feb 25 2013 → Feb 28 2013

Publication series

Series	Proceedings of SPIE - The International Society for Optical Engineering
Volume	8680
ISSN	0277-786X

Conference

Conference	Alternative Lithographic Technologies V
Country/Territory	United States
City	San Jose, CA
Period	2/25/13 → 2/28/13

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 9 Industry, Innovation, and Infrastructure

ASJC Scopus Subject Areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Keywords

χ
Coarse grained
Computational
Directed self-assembly
GPU
LER
LWR
Molecular dynamics
PDI
Roughness

Access to Document

10.1117/12.2021443

Cite this

Effects of block copolymer polydispersity and χN on pattern line edge roughness and line width roughness from directed self-assembly of diblock copolymers. / Peters, Andrew J.; Lawson, Richard A.; Ludovice, Peter J. et al.
Alternative Lithographic Technologies V. 2013. 868020 (Proceedings of SPIE - The International Society for Optical Engineering, Vol. 8680).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Peters, AJ, Lawson, RA, Ludovice, PJ & Henderson, CL 2013, Effects of block copolymer polydispersity and χN on pattern line edge roughness and line width roughness from directed self-assembly of diblock copolymers. in Alternative Lithographic Technologies V., 868020, Proceedings of SPIE - The International Society for Optical Engineering, vol. 8680, Alternative Lithographic Technologies V, San Jose, CA, United States, 2/25/13. https://doi.org/10.1117/12.2021443

Peters AJ, Lawson RA, Ludovice PJ, Henderson CL. Effects of block copolymer polydispersity and χN on pattern line edge roughness and line width roughness from directed self-assembly of diblock copolymers. In Alternative Lithographic Technologies V. 2013. 868020. (Proceedings of SPIE - The International Society for Optical Engineering, Vol. 8680). doi: 10.1117/12.2021443

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keywords = "χ, Coarse grained, Computational, Directed self-assembly, GPU, LER, LWR, Molecular dynamics, PDI, Roughness",

author = "Peters, \{Andrew J.\} and Lawson, \{Richard A.\} and Ludovice, \{Peter J.\} and Henderson, \{Clifford L.\}",

year = "2013",

doi = "10.1117/12.2021443",

language = "English",

isbn = "9780819494627",

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AU - Henderson, Clifford L.

PY - 2013

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KW - Coarse grained

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KW - GPU

KW - LER

KW - LWR

KW - Molecular dynamics

KW - PDI

KW - Roughness

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M3 - Conference contribution

AN - SCOPUS:84878393858

SN - 9780819494627

T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - Alternative Lithographic Technologies V

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Y2 - 25 February 2013 through 28 February 2013

ER -

Effects of block copolymer polydispersity and χN on pattern line edge roughness and line width roughness from directed self-assembly of diblock copolymers

Publication series

Conference

UN SDGs

ASJC Scopus Subject Areas

Keywords

Access to Document

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