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Hollow-cathode chemical vapor deposition of thick, low-stress diamond-like carbon films

  • J. Miller
  • , A. Ceballos
  • , L. B. Bayu Aji
  • , A. Moore
  • , C. Wasz
  • , S. O. Kucheyev
  • , S. Elhadj
  • , S. Falabella
  • Lawrence Livermore National Laboratory
  • United States Air Force Academy

Research output: Contribution to journalArticlepeer-review

Original languageEnglish
Article number138394
JournalThin Solid Films
Volume714
DOIs
StatePublished - Nov 30 2020
Externally publishedYes

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

  1. SDG 7 - Affordable and Clean Energy
    SDG 7 Affordable and Clean Energy

ASJC Scopus Subject Areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Keywords

  • Amorphous hydrogenated carbon
  • Coatings
  • Diamond-like carbon
  • Plasma chemical vapor deposition

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