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Predicting process windows for pattern density multiplication using block copolymer directed self-assembly in conjunction with chemoepitaxial guiding layers

  • Benjamin D. Nation
  • , Andrew Peters
  • , Richard A. Lawson
  • , Peter J. Ludovice
  • , Clifford L. Henderson
  • Georgia Institute of Technology

Research output: Contribution to journalArticlepeer-review

Original languageAmerican English
JournalProceedings of SPIE
Volume9049
DOIs
StatePublished - Mar 28 2014
Externally publishedYes

Disciplines

  • Physics
  • Optics

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