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The effect of helium plasma etching on polymer-based optoelectronic devices

  • Institute for Micromanufacturing

Research output: Contribution to journalArticlepeer-review

Original languageEnglish
Pages (from-to)5743-5746
Number of pages4
JournalThin Solid Films
Volume517
Issue number19
DOIs
StatePublished - Aug 3 2009
Externally publishedYes

ASJC Scopus Subject Areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Keywords

  • Etching
  • Optoelectronic devices
  • Organic semiconductors
  • Polymers

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